A black mask (BM) is a layer used to improve the display quality by suppressing light leakage. In general, the BM is formed by a photolithography process. In this study, a novel technique for the fabrication of a quasi-black mask (q-BM) is proposed; the q-BM was composed of vertical and hybrid orientation areas, patterned by a separation coating technique using an electro-spray deposition method. Using our technique, the q-BM can be formed easily without the additional masks used for the BM.