Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals

Satoshi KAWATA; Satoru SHOJI; Hong-Bo SUN

Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals

Satoshi KAWATA, Satoru SHOJI, Hong-Bo SUN

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Lasers have been established as a unique nanoprocessing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.

Publication: IEICE TRANSACTIONS on Electronics Vol.E87-C No.3 pp.378-385

Publication Date: 2004/03/01

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Type of Manuscript: Special Section INVITED PAPER (Special Section on Photonic Crystals and Their Device Applications)

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Satoshi KAWATA, Satoru SHOJI, Hong-Bo SUN, "Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals" in IEICE TRANSACTIONS on Electronics, vol. E87-C, no. 3, pp. 378-385, March 2004, doi: .
Abstract: Lasers have been established as a unique nanoprocessing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.
URL: https://globals.ieice.org/en_transactions/electronics/10.1587/e87-c_3_378/_p

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@ARTICLE{e87-c_3_378,
author={Satoshi KAWATA, Satoru SHOJI, Hong-Bo SUN, },
journal={IEICE TRANSACTIONS on Electronics},
title={Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals},
year={2004},
volume={E87-C},
number={3},
pages={378-385},
abstract={Lasers have been established as a unique nanoprocessing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.},
keywords={},
doi={},
ISSN={},
month={March},}

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TY - JOUR
TI - Pinpoint Two-Photon Writing and Multi-Beam Interferential Patterning of Three-Dimensional Polymer Photonic Crystals
T2 - IEICE TRANSACTIONS on Electronics
SP - 378
EP - 385
AU - Satoshi KAWATA
AU - Satoru SHOJI
AU - Hong-Bo SUN
PY - 2004
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E87-C
IS - 3
JA - IEICE TRANSACTIONS on Electronics
Y1 - March 2004
AB - Lasers have been established as a unique nanoprocessing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.
ER -