Deposition of Inclined Magnetic Anisotropy Film by Oblique Incidence Collimated Sputtering

Naoki HONDA, Akito HONDA

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Summary :

Deposition of inclined anisotropy film for bit-patterned media was studied using an oblique incidence collimated sputtering. Pt underlayer increased the inclination angle of magnetic layer more than 5° on a Ta seed layer. Further increase of the angle was obtained by annealing Pt/Ru underlayer resulting an inclination angle of 9.4° for a Co-Cr15.5 film on the underlayer. The magnetic properties of the Co-Cr15.5 film with an inclined orientation was estimated comparing measured hysteresis loops with simulated ones, which indicated to have inclined magnetic anisotropy with an anisotropy field of about 4.5kOe and a deflection angle of the anisotropy about the same as that of the crystalline orientation.

Publication
IEICE TRANSACTIONS on Electronics Vol.E96-C No.12 pp.1469-1473
Publication Date
2013/12/01
Publicized
Online ISSN
1745-1353
DOI
10.1587/transele.E96.C.1469
Type of Manuscript
Special Section PAPER (Special Section on Advanced Elementary Technologies for Information Storage)
Category

Authors

Naoki HONDA
  Tohoku Institute of Technology
Akito HONDA
  Tohoku Institute of Technology

Keyword

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