Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting

Nobuya HIROSHIBA; Wataru YANO; Ryuji OKUMURA; Yo ICHIKAWA

doi:10.1587/transele.E98.C.133

Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting

Nobuya HIROSHIBA, Wataru YANO, Ryuji OKUMURA, Yo ICHIKAWA

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We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm² square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

Publication: IEICE TRANSACTIONS on Electronics Vol.E98-C No.2 pp.133-135

Publication Date: 2015/02/01

Publicized

Online ISSN: 1745-1353

DOI: 10.1587/transele.E98.C.133

Type of Manuscript: BRIEF PAPER

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Authors

Nobuya HIROSHIBA
  Tohoku University, Nagoya Institute of Technology
Wataru YANO
  Nagoya Institute of Technology
Ryuji OKUMURA
  Nagoya Institute of Technology
Yo ICHIKAWA
  Nagoya Institute of Technology

Keyword

Nanoimprinting, Ion-conductive polymer, Nafion, Flexible devices

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Nobuya HIROSHIBA, Wataru YANO, Ryuji OKUMURA, Yo ICHIKAWA, "Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting" in IEICE TRANSACTIONS on Electronics, vol. E98-C, no. 2, pp. 133-135, February 2015, doi: 10.1587/transele.E98.C.133.
Abstract: We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm² square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.
URL: https://globals.ieice.org/en_transactions/electronics/10.1587/transele.E98.C.133/_p

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@ARTICLE{e98-c_2_133,
author={Nobuya HIROSHIBA, Wataru YANO, Ryuji OKUMURA, Yo ICHIKAWA, },
journal={IEICE TRANSACTIONS on Electronics},
title={Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting},
year={2015},
volume={E98-C},
number={2},
pages={133-135},
abstract={We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm² square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.},
keywords={},
doi={10.1587/transele.E98.C.133},
ISSN={1745-1353},
month={February},}

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TY - JOUR
TI - Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting
T2 - IEICE TRANSACTIONS on Electronics
SP - 133
EP - 135
AU - Nobuya HIROSHIBA
AU - Wataru YANO
AU - Ryuji OKUMURA
AU - Yo ICHIKAWA
PY - 2015
DO - 10.1587/transele.E98.C.133
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E98-C
IS - 2
JA - IEICE TRANSACTIONS on Electronics
Y1 - February 2015
AB - We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm² square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.
ER -