Ar Sputter-Etching of YIG and Ta<SUB>2</SUB>O<SUB>5</SUB> and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films

Tetsuya MIZUMOTO; Yoshiyuki NAITO

Ar Sputter-Etching of YIG and Ta₂O₅ and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films

Tetsuya MIZUMOTO, Yoshiyuki NAITO

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A microfabrication technique using a sputter-etching with Ar, including the process of a mask formation, is described. A Ti etch resistant mask was formed by using a lift-off technique following an electron beam exposure lithography. The sputter-etch rate of YIG, Ta₂O₅, Ti and Al were determined. Grating patterns with fairly deep grooves were fabricated on YIG and Ta₂O₅ successfully.

Publication: IEICE TRANSACTIONS on transactions Vol.E67-E No.2 pp.84-87

Publication Date: 1984/02/25

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Type of Manuscript: PAPER

Category: Optical and Quantum Electronics

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Tetsuya MIZUMOTO
Yoshiyuki NAITO

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Tetsuya MIZUMOTO, Yoshiyuki NAITO, "Ar Sputter-Etching of YIG and Ta2O5 and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films" in IEICE TRANSACTIONS on transactions, vol. E67-E, no. 2, pp. 84-87, February 1984, doi: .
Abstract: A microfabrication technique using a sputter-etching with Ar, including the process of a mask formation, is described. A Ti etch resistant mask was formed by using a lift-off technique following an electron beam exposure lithography. The sputter-etch rate of YIG, Ta₂O₅, Ti and Al were determined. Grating patterns with fairly deep grooves were fabricated on YIG and Ta₂O₅ successfully.
URL: https://globals.ieice.org/en_transactions/transactions/10.1587/e67-e_2_84/_p

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@ARTICLE{e67-e_2_84,
author={Tetsuya MIZUMOTO, Yoshiyuki NAITO, },
journal={IEICE TRANSACTIONS on transactions},
title={Ar Sputter-Etching of YIG and Ta2O5 and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films},
year={1984},
volume={E67-E},
number={2},
pages={84-87},
abstract={A microfabrication technique using a sputter-etching with Ar, including the process of a mask formation, is described. A Ti etch resistant mask was formed by using a lift-off technique following an electron beam exposure lithography. The sputter-etch rate of YIG, Ta₂O₅, Ti and Al were determined. Grating patterns with fairly deep grooves were fabricated on YIG and Ta₂O₅ successfully.},
keywords={},
doi={},
ISSN={},
month={February},}

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TY - JOUR
TI - Ar Sputter-Etching of YIG and Ta2O5 and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films
T2 - IEICE TRANSACTIONS on transactions
SP - 84
EP - 87
AU - Tetsuya MIZUMOTO
AU - Yoshiyuki NAITO
PY - 1984
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E67-E
IS - 2
JA - IEICE TRANSACTIONS on transactions
Y1 - February 1984
AB - A microfabrication technique using a sputter-etching with Ar, including the process of a mask formation, is described. A Ti etch resistant mask was formed by using a lift-off technique following an electron beam exposure lithography. The sputter-etch rate of YIG, Ta₂O₅, Ti and Al were determined. Grating patterns with fairly deep grooves were fabricated on YIG and Ta₂O₅ successfully.
ER -