Ultraviolet-Enhanced Plasma Anodization

Koki MATSUMURA

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Summary :

In this letter a newly developed method of plasma anodization is proposed. This is worked on by irradiating the ultraviolet light onto the specimen of Al thin films. It is observed that the ionic current through the specimen is increased by uv light. And, it could be concluded that the uv irradiation has an effect to enhance the anodization rate.

Publication
IEICE TRANSACTIONS on transactions Vol.E72-E No.4 pp.299-302
Publication Date
1989/04/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section LETTER (Special Issue on 1989 Spring National Convention IEICE)
Category
Components and Materials

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