Noise characteristics of InAlAs/InGaAs HEMT's passivated by SiN are investigated to ascertain their suitability for practical applications in circuit such as MMIC's. A 0.18-µm-gate-length device with 125-µm-gate width and 8-gate fingers showed the lowest minimum noise figure of 0.43 dB at 26 GHz with an associated gain of 8.5 dB of any passivated device ever reported. This value is also comparable to the lowest reported minimum noise figure obtained by bare InAlAs/InGaAs HEMT's in spite of increased parasitic capacitances due to the SiN passivation. Thes excellent noise performance was achieved by employing non-alloyed ohmic contact, a T-shaped gate geometry and a multi-finger gate pattern. To reduce the contact resistance of the non-alloyed ohmic contact, a novel n+-InGaAs/n+-InAlAs cap layer was used resulting in a very low contact resistance of 0.09 Ωmm and a low sheet resistance for all layers of 145 Ω/sq. No increase in these resistances was observed after SiN passivation, and a very low source resistance of 0.16 Ωmm was obtained. An analysis of equivalent circuit parameters revealed that the T-shaped gate and multi-finger gate pattern drastically decrease gate resistance.

We discuss delay times derived from the current gain cutoff frequency of a heterostructure field effect transistor and describe three types of novel channel structures for millimeter-wave InP-based HFETs. The first structure discussed is a lattice-matched InGaAs HEMT with high state-of-the art performance. The second structure is an InAs-inserted InGaAs HEMT which harnesses the superior transport properties of InAs. Fabricated devices show high electron mobility of 12,800 cm2/Vs and high transconductance over 1.4 S/mm for a 0.6-µm-gate length. The effective saturation velocity in the device derived from the current gain cutoff frequency in 3.0107 cm/s. The third one is an InGaAs/InP double-channel HFET that utilizes the superior transport properties of InP at a high electric field. Fabricated double-channel devices show kink-free characteristics, high carrier density of 4.51012 cm-2 and high transconductance of 1.3 S/mm for a 0.6-µm-gate length. The estimated effective saturation velocity in these devices is 4.2107 cm/s. Also included is a discussion of the current gain cutoff frequency of ultra-short channel devices.