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[Author] Takayuki OKADA(1hit)
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Nanometer Process of Nb Film and Its Application to Josephson Junctions
Nobumitsu HIROSE Takayuki OKADA Shigeru YOSHIMORI Mitsuo KAWAMURA
- LETTER-Superconductive Electronics
- Vol:
- E72-E No:5
- Page(s):
- 575-577
We successfully fabricated a very narrow gap in niobium film using electron beam lithography and RIE. The width of the gap was about 40 nm. We applied this process to the fabrication of Nb-PbIn-Nb planar Josephson junctions, and one of them showed the Dayem effect.
