Nanometer Process of Nb Film and Its Application to Josephson Junctions

Nobumitsu HIROSE; Takayuki OKADA; Shigeru YOSHIMORI; Mitsuo KAWAMURA

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Nobumitsu HIROSE, Takayuki OKADA, Shigeru YOSHIMORI, Mitsuo KAWAMURA, "Nanometer Process of Nb Film and Its Application to Josephson Junctions" in IEICE TRANSACTIONS on transactions, vol. E72-E, no. 5, pp. 575-577, May 1989, doi: .
Abstract: We successfully fabricated a very narrow gap in niobium film using electron beam lithography and RIE. The width of the gap was about 40 nm. We applied this process to the fabrication of Nb-PbIn-Nb planar Josephson junctions, and one of them showed the Dayem effect.
URL: https://globals.ieice.org/en_transactions/transactions/10.1587/e72-e_5_575/_p

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@ARTICLE{e72-e_5_575,
author={Nobumitsu HIROSE, Takayuki OKADA, Shigeru YOSHIMORI, Mitsuo KAWAMURA, },
journal={IEICE TRANSACTIONS on transactions},
title={Nanometer Process of Nb Film and Its Application to Josephson Junctions},
year={1989},
volume={E72-E},
number={5},
pages={575-577},
abstract={We successfully fabricated a very narrow gap in niobium film using electron beam lithography and RIE. The width of the gap was about 40 nm. We applied this process to the fabrication of Nb-PbIn-Nb planar Josephson junctions, and one of them showed the Dayem effect.},
keywords={},
doi={},
ISSN={},
month={May},}

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TY - JOUR
TI - Nanometer Process of Nb Film and Its Application to Josephson Junctions
T2 - IEICE TRANSACTIONS on transactions
SP - 575
EP - 577
AU - Nobumitsu HIROSE
AU - Takayuki OKADA
AU - Shigeru YOSHIMORI
AU - Mitsuo KAWAMURA
PY - 1989
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E72-E
IS - 5
JA - IEICE TRANSACTIONS on transactions
Y1 - May 1989
AB - We successfully fabricated a very narrow gap in niobium film using electron beam lithography and RIE. The width of the gap was about 40 nm. We applied this process to the fabrication of Nb-PbIn-Nb planar Josephson junctions, and one of them showed the Dayem effect.
ER -