Three-Dimensional Evaluation of Substrate Current in Recessed-Oxide MOSFETs

Anna PIERANTONI, Paolo CIAMPOLINI, Antonio GNUDI, Giorgio BACCARANI

  • Full Text Views

    0

  • Cite this

Summary :

In this paper, a "hydrodynamic" version of the three-dimensional code HFIELDS-3D is used to achieve a detailed knowledge on the distribution of the substrate current inside a recessed-oxide MOSFET. The physical model features a temperature-dependent formulation of the impact-ionization rate, allowing non-local effects to be accounted for. The discretization strategy relies on the Box Integration scheme and uses suitable generalizations of the Scharfetter-Gummel technique for the energy-balance equation. The simulation results show that the narrow-channel effect has a different impact on drain and substrate currents. Further three-dimensional effects, such as the extra heating of the carriers at the channel edge, are demonstrated.

Publication
IEICE TRANSACTIONS on Electronics Vol.E75-C No.2 pp.181-188
Publication Date
1992/02/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Issue on Selected Papers from '91 VPAD)
Category

Authors

Keyword

FlyerIEICE has prepared a flyer regarding multilingual services. Please use the one in your native language.