A Uniform and Dense Microwave Plasma

Kazuaki SENDA; Koutarou UMEHARA; Yuichi SAKAMOTO

A Uniform and Dense Microwave Plasma

Kazuaki SENDA, Koutarou UMEHARA, Yuichi SAKAMOTO

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Based on an experimental fact that surface wave plasmas excited by strongly coupled microwave through thin dielectric windows show nearly perfect absorption of microwave and, after diffusion, form a widely uniform dense plasma. A plasma with an uniformity of 5% over an area of 50 cm 60 cm was produced. The plasma produced by application of 2400 W total microwave power gives 1 10¹¹ cm^-3 in density and 1.5 eV in electron temperature.

Publication: IEICE TRANSACTIONS on Electronics Vol.E86-C No.12 pp.2479-2481

Publication Date: 2003/12/01

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Type of Manuscript: Special Section PAPER (Special Issue on Recent Trends on Microwave and Millimeter Wave Application Technology)

Category: Plasma

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Kazuaki SENDA, Koutarou UMEHARA, Yuichi SAKAMOTO, "A Uniform and Dense Microwave Plasma" in IEICE TRANSACTIONS on Electronics, vol. E86-C, no. 12, pp. 2479-2481, December 2003, doi: .
Abstract: Based on an experimental fact that surface wave plasmas excited by strongly coupled microwave through thin dielectric windows show nearly perfect absorption of microwave and, after diffusion, form a widely uniform dense plasma. A plasma with an uniformity of 5% over an area of 50 cm 60 cm was produced. The plasma produced by application of 2400 W total microwave power gives 1 10¹¹ cm^-3 in density and 1.5 eV in electron temperature.
URL: https://globals.ieice.org/en_transactions/electronics/10.1587/e86-c_12_2479/_p

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@ARTICLE{e86-c_12_2479,
author={Kazuaki SENDA, Koutarou UMEHARA, Yuichi SAKAMOTO, },
journal={IEICE TRANSACTIONS on Electronics},
title={A Uniform and Dense Microwave Plasma},
year={2003},
volume={E86-C},
number={12},
pages={2479-2481},
abstract={Based on an experimental fact that surface wave plasmas excited by strongly coupled microwave through thin dielectric windows show nearly perfect absorption of microwave and, after diffusion, form a widely uniform dense plasma. A plasma with an uniformity of 5% over an area of 50 cm 60 cm was produced. The plasma produced by application of 2400 W total microwave power gives 1 10¹¹ cm^-3 in density and 1.5 eV in electron temperature.},
keywords={},
doi={},
ISSN={},
month={December},}

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TY - JOUR
TI - A Uniform and Dense Microwave Plasma
T2 - IEICE TRANSACTIONS on Electronics
SP - 2479
EP - 2481
AU - Kazuaki SENDA
AU - Koutarou UMEHARA
AU - Yuichi SAKAMOTO
PY - 2003
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E86-C
IS - 12
JA - IEICE TRANSACTIONS on Electronics
Y1 - December 2003
AB - Based on an experimental fact that surface wave plasmas excited by strongly coupled microwave through thin dielectric windows show nearly perfect absorption of microwave and, after diffusion, form a widely uniform dense plasma. A plasma with an uniformity of 5% over an area of 50 cm 60 cm was produced. The plasma produced by application of 2400 W total microwave power gives 1 10¹¹ cm^-3 in density and 1.5 eV in electron temperature.
ER -