Texturization for Multi-Crystalline Silicon Solar Cells with Chlorine Trifluoride Gas and Acid Solution

Takahiro SANDA; Yoji SAITO

doi:10.1587/transele.E96.C.289

Texturization for Multi-Crystalline Silicon Solar Cells with Chlorine Trifluoride Gas and Acid Solution

Takahiro SANDA, Yoji SAITO

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We have investigated on a random-texturing process for multi-crystalline Si solar cells by plasmaless dry etching, with chlorine trifluoride (ClF₃) gas treatments. The reflectance of textured surfaces was reduced to below 20% at a wavelength of 600 nm. In this study, we tried to improve the electrical characteristics by modifying the fabrication process. The substrate surfaces were dry etched by chlorine trifluoride gas and subsequently etched with an acid solution to form appropriate textured structures. The improved electrical characteristics were demonstrated.

Publication: IEICE TRANSACTIONS on Electronics Vol.E96-C No.2 pp.289-291

Publication Date: 2013/02/01

Publicized

Online ISSN: 1745-1353

DOI: 10.1587/transele.E96.C.289

Type of Manuscript: BRIEF PAPER

Category: Semiconductor Materials and Devices

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Takahiro SANDA, Yoji SAITO, "Texturization for Multi-Crystalline Silicon Solar Cells with Chlorine Trifluoride Gas and Acid Solution" in IEICE TRANSACTIONS on Electronics, vol. E96-C, no. 2, pp. 289-291, February 2013, doi: 10.1587/transele.E96.C.289.
Abstract: We have investigated on a random-texturing process for multi-crystalline Si solar cells by plasmaless dry etching, with chlorine trifluoride (ClF₃) gas treatments. The reflectance of textured surfaces was reduced to below 20% at a wavelength of 600 nm. In this study, we tried to improve the electrical characteristics by modifying the fabrication process. The substrate surfaces were dry etched by chlorine trifluoride gas and subsequently etched with an acid solution to form appropriate textured structures. The improved electrical characteristics were demonstrated.
URL: https://globals.ieice.org/en_transactions/electronics/10.1587/transele.E96.C.289/_p

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@ARTICLE{e96-c_2_289,
author={Takahiro SANDA, Yoji SAITO, },
journal={IEICE TRANSACTIONS on Electronics},
title={Texturization for Multi-Crystalline Silicon Solar Cells with Chlorine Trifluoride Gas and Acid Solution},
year={2013},
volume={E96-C},
number={2},
pages={289-291},
abstract={We have investigated on a random-texturing process for multi-crystalline Si solar cells by plasmaless dry etching, with chlorine trifluoride (ClF₃) gas treatments. The reflectance of textured surfaces was reduced to below 20% at a wavelength of 600 nm. In this study, we tried to improve the electrical characteristics by modifying the fabrication process. The substrate surfaces were dry etched by chlorine trifluoride gas and subsequently etched with an acid solution to form appropriate textured structures. The improved electrical characteristics were demonstrated.},
keywords={},
doi={10.1587/transele.E96.C.289},
ISSN={1745-1353},
month={February},}

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TY - JOUR
TI - Texturization for Multi-Crystalline Silicon Solar Cells with Chlorine Trifluoride Gas and Acid Solution
T2 - IEICE TRANSACTIONS on Electronics
SP - 289
EP - 291
AU - Takahiro SANDA
AU - Yoji SAITO
PY - 2013
DO - 10.1587/transele.E96.C.289
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E96-C
IS - 2
JA - IEICE TRANSACTIONS on Electronics
Y1 - February 2013
AB - We have investigated on a random-texturing process for multi-crystalline Si solar cells by plasmaless dry etching, with chlorine trifluoride (ClF₃) gas treatments. The reflectance of textured surfaces was reduced to below 20% at a wavelength of 600 nm. In this study, we tried to improve the electrical characteristics by modifying the fabrication process. The substrate surfaces were dry etched by chlorine trifluoride gas and subsequently etched with an acid solution to form appropriate textured structures. The improved electrical characteristics were demonstrated.
ER -