Perturbation Approach for Order Selections of Two-Sided Oblique Projection-Based Interconnect Reductions

Chia-Chi CHU, Ming-Hong LAI, Wu-Shiung FENG

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Summary :

An order selection scheme for two-sided oblique projection-based interconnect reduction will be investigated. It will provide a guideline for terminating the conventional nonsymmetric Pade via Lanczos (PVL) iteration process. By exploring the relationship of the system Grammians of the original network and those of the reduced network, it can be shown that the system matrix of the reduced-order system generated by the two-sided oblique projection can also be expressed as those of the original interconnect model with some additive perturbations. The perturbation matrix only involves bi-orthogonal vectors at the previous step of the nonsymmetric Lanczos algorithm. This perturbation matrix will provide the stopping criteria in the order selection scheme and achieve the desired accuracy of the approximate transfer function.

Publication
IEICE TRANSACTIONS on Fundamentals Vol.E88-A No.12 pp.3573-3576
Publication Date
2005/12/01
Publicized
Online ISSN
DOI
10.1093/ietfec/e88-a.12.3573
Type of Manuscript
Special Section LETTER (Special Section on VLSI Design and CAD Algorithms)
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