We developed a 300-GHz high gain amplifier MMIC in 75-nm InP high electron mobility transistor technology. We approached the issues with accurate characterization of devices to design the amplifier. The on-wafer through-reflect-line calibration technique was used to obtain accurate transistor characteristics. To increase measurement accuracy, a highly isolated structure was used for on-wafer calibration standards. The common source amplifier topology was used for achieving high gain amplification. The implemented amplifier MMIC exhibited a gain of over 25 dB in the 280-310-GHz frequency band.

Gallium nitride high electron mobility transistors (GaN HEMTs) were developed for millimeter-wave high power amplifier applications. The device with a gate length of 80 nm and an InAlN barrier layer exhibited high drain current of more than 1.2 A/mm and high breakdown voltage of 73,V. A cut-off frequency $ extrm{f}_{ extrm{T}}$ of 113,GHz and maximum oscillation frequency $ extrm{f}_{ extrm{max}}$ of 230,GHz were achieved. The output power density reached 1 W/mm with a linear gain of 6.4,dB at load-pull measurements at 90,GHz. And we extracted equivalent circuit model parameters of the millimeter-wave InAlN/GaN HEMT and showed that the model was useful in simulating the millimeter-wave power performance. Also, we report a preliminary constant bias stress test result.

In this paper, we describe the operation of circuits capable of more than 40-Gbit/s that we have developed using InP HEMT technology. For example, we succeeded in obtaining 43-Gbit/s operation for a full-rate 4:1Multiplier (MUX), 50-Gbit/s operation for a Demultiplexer (DEMUX), 50-Gbit/s operation for a D-type flip-flop (D-FF), and a preamplifier with a bandwidth of 40 GHz. In addition, the achievement of 90-Gbit/s operation for a 2:1MUX and a distributed amplifier with over 110-GHz bandwidth indicates that InP HEMT technology is promising for system operations of over 100 Gbit/s. To achieve these results, we also developed several design techniques to improve frequency response above 80 GHz including a symmetric and separated layout of differential elements in the basic SCFL gate and inverted microstrip.