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Suguru TACHIBANA Hisayuki HIGUCHI Koichi TAKASUGI Katsuro SASAKI Toshiaki YAMANAKA Yoshinobu NAKAGOME
The dual-sensing-latch circuit proposed here can solve the synchronization problem of the conventional wave-pipelined SRAM, and the proposed source-biased self-resetting circuit reduces both the cycle and access time of cache SRAM's. A 16-kb SRAM using these circuit techniques was designed, and was fabricated with 0.25-µm CMOS technology. Simulation results indicate that this SRAM has a typical clock access time of 2.6 ns at 2.5-V supply voltage and a worst minimum cycle time of 2.6 ns.
Masataka MINAMI Nagatoshi OHKI Hiroshi ISHIDA Toshiaki YAMANAKA Akihiro SHIMIZU Koichiro ISHIBASHI Akira SATOH Tokuo KURE Takashi NISHIDA Takahiro NAGANO
A high-performance microprocessor-compatible small size full CMOS SRAM cell technology for under 1.8-V operation has been developed. Less than 1-µm spacing between the n and pMOSFETs is achieved by using a retrograde well combined with SSS-OSELO technology. To connect the gates of a driver nMOSFET and a load pMOSFET directly, a 0.3-µm n-gate load pMOSFET, formed by amorphous-Si-film through-channel implantation, is merged with a 0.25-µm p-gate pMOSFET for the peripheral circuits. The memory cell area is reduced by using a mask-free contact process for the local interconnect, which includes titanium-nitride wet-etching using a plasma-TEOS silicone-dioxide mask. The newly developed memory cell was demonstrated using 0.25-µm CMOS process technology. A 6.93-µm2 and 1-V operation full CMOS SRAM cell with a high-performance circuit was achieved by a simple fabrication process.
Koichiro ISHIBASHI Koichi TAKASUGI Kunihiro KOMIYAJI Hiroshi TOYOSHIMA Toshiaki YAMANAKA Akira FUKAMI Naotaka HASHIMOTO Nagatoshi OHKI Akihiro SHIMIZU Takashi HASHIMOTO Takahiro NAGANO Takashi NISHIDA
A 4-Mb CMOS SRAM with 3.84 µm2 TFT load cells is fabricated using 0.25-µm CMOS technology and achieves an address access time of 6 ns at a supply voltage of 2.7 V. The use of a current sense amplifier that is insensitive to its offset voltage enables the fast access time. A boosted cell array architecture allows low voltage operation of fast SRAM's using TFT load cells.
Koichiro ISHIBASHI Kunihiro KOMIYAJI Sadayuki MORITA Toshiro AOTO Shuji IKEDA Kyoichiro ASAYAMA Atsuyosi KOIKE Toshiaki YAMANAKA Naotaka HASHIMOTO Haruhito IIDA Fumio KOJIMA Koichi MOTOHASHI Katsuro SASAKI
A 16-Mb CMOS SRAM using 0.4-µm CMOS technology has been developed. This SRAM features common-centroid-geometry (CCG) layout sense amplifiers which shorten the access time by 2.4 ns. A flexible redundancy technique achieves high efficiency without any access penalty. A memory cell with stacked capacitors is fabricated for high soft-error immunity. A 16-Mb SRAM with a chip size of 215 mm2 is fabricated and an address access time of 12.5 ns has been achieved.
Koichiro ISHIBASHI Katsuro SASAKI Toshiaki YAMANAKA Hiroshi TOYOSHIMA Fumio KOJIMA
An all-CMOS output buffer has been developed. The output buffer is composed of a voltage-follower and a source-follower circuit. The performance of the output buffer is characterized by a low-voltage operation of 1.7 V, a short delay of 1 ns, availability for the wired-OR connection, and adjustability to TTL, ECL, and a reduced swing level (RSL). The output buffer is incorporated into a 64-kb CMOS SRAM. This SRAM has achieved an access time of 4.3 ns at a supply voltage of -3.6 V.