In this paper we present eigenmode analysis of the propagation constant for a microstrip line with dummy fills on a Si CMOS substrate. The effect of dummy fills is not negligible, particularly in the millimeter-wave band, although it has been ignored below frequencies of a few GHz. The propagation constant of a microstrip line with a periodic structure on a Si CMOS substrate is analyzed by eigenmode analysis for one period of the line. The calculated propagation constant and characteristic impedance were compared with measured values for a chip fabricated by the 0.18 µm CMOS process. The agreement between the analysis and measurement was very good. The dependence of loss on the arrangement of dummy fills was also investigated by eigenmode analysis. It was found that the transmission loss becomes large when dummy fills are arranged at places where the electromagnetic field is strong.

This paper studies the impact of dummy fill for chemical mechanical polishing (CMP)-induced capacitance variation on buffer insertion based on a virtual CMP fill estimation model. Compared with existing methods, our algorithm is more feasible by performing buffer insertion not in post-process but during early physical design. Our contributions are threefold. First, we introduce an improved fast dummy fill amount estimation algorithm based on [4], and use some speedup techniques (tile merging, fill factor and amount assigning) for early estimation. Second, based on some reasonable assumptions, we present an optimum virtual dummy fill method to estimate dummy position and the effect on the interconnect capacitance. Then the dummy fill estimation model was verified by our experiments. Third, we use this model in early buffer insertion after layer assignment considering the effects of dummy fill. Experimental results verified the necessity of early dummy fill estimation and the validity of our algorithm. Buffer insertion considering dummy fill during early physical design is necessary and our algorithm is promising.

In advanced ASIC/SoC physical designs, interconnect parasitic extraction is one of the important factors to determine the accuracy of timing analysis. We present a formula-based method to efficiently extract interconnect capacitances of interconnects with dummy fills for VLSI designs. The whole flow is as follows: 1) in each process, obtain capacitances per unit length using a 3-D field solver and then create formulas, and 2) in the actual design phase, execute a well-known 2.5-D capacitance extraction. Our results indicated that accuracies of the proposed formulas were almost within 3% error. The proposed formula-based method can extract interconnect capacitances with high accuracy for VLSI circuits. Moreover, we present formulas to evaluate the effect of dummy fills on interconnect capacitances. These can be useful for determining design guidelines, such as metal density before the actual design, and for analyzing the effect of each structural parameter during the design phase.

Floating dummy metal fills inserted for planarization of multi-dielectric layers have created serious problems because of increased interconnect capacitance and the enormous number of fills. We present new dummy filling methods to reduce the interconnect capacitance and the number of dummy metal fills needed. These techniques include three ways of filling: 1) improved floating square fills, 2) floating parallel lines, and 3) floating perpendicular lines (with spacing between dummy metal fills above and below signal lines). We also present efficient formulas for estimating the appropriate spacing and number of fills. In our experiments, the capacitance increase using the conventional regular square method was 13.1%, while that using the methods of improved square fills, extended parallel lines, and perpendicular lines were 2.7%, 2.4%, and 1.0%, respectively. Moreover, the number of necessary dummy metal fills can be reduced by two orders of magnitude through use of the parallel line method.

We present a practical method of dealing with the influences of floating dummy metal fills, which are inserted to assist planarization by chemical-mechanical polishing (CMP) process, in extracting interconnect capacitances for system-on-chip (SoC) designs. The method is based on reducing the thicknesses of dummy metal layers according to electrical field theory. We also clarify the influences of dummy metal fills on the parasitic capacitance, signal delay, and crosstalk noise. Moreover, we address that interlayer dummy metal fills have more significant influences than intralayer ones in terms of the impact on coupling capacitances. When dummy metal fills are ignored, the error of capacitance extraction can be more than 30%, whereas the error of the proposed method is less than about 10% for many practical geometries. We also demonstrate, by comparison with capacitance results measured for a 90-nm test chip, that the error of the proposed method is less than 8%.