This paper describes new IC design concepts using flip-chip bonding technologies for microwave and millimeter-wave circuit integration. Two types of bonding technologies, stud bump bonding (SBB) and micro bump bonding (MBB) are introduced, and their applications to microwave and millimeter-wave ICs are presented. Receiver front-end hybrid IC (HIC) for cellular and PHS handsets using SBB and new millimeter-wave ICs on Si substrate called millimeter flip-chip IC (MFIC) using MBB have been designed and fabricated to prove their advantages. These flip-chip bonding technologies are experimentally proven to provide excellent solutions for high performance and compact-sized ICs with low-cost. The HIC concept is applicable consistently over a wide range of devices from RF/microwave to millimeter-wave region.

Highly miniaturization technology in front-end GaAs Hybrid IC for mobile communication equipment will be presented. A combination of MBB (micro bump bonding) technology and the new GaAs IC fabrication process using high dielectric constant (εr) thin film technology has achieved a super small HIC with low cost and low power consumption. The new HIC was constructed of only a ceramic substrate in which the spiral inductors were formed on it and the GaAs IC chip that was bonded by using MBB technology. The MBB technology lead the HIC to a lower temperature process without soldering, a smaller bump diameter, at shorter intervals and the lowest parasitic in the bump. The advantage of the small bonding pad of the IC contributes to miniaturize the IC chip and reduces the chip cost. The GaAs IC process technology using high-εr thin film achieves the integration of all capacitors in the IC without increasing the chip size. Furthermore, low power consumption was achieved by 0. 5-µm LDD BP-MESFET with a high k-value. Although capacitors were integrated on the IC, all of the inductors were formed on the top of the ceramic substrate using a thin film metal process. This was used due to its large occupation area when it was integrated on the IC, and produced a low Q-factor. As a results, the chip was minimized to a size of 0. 81. 0 mm2 and achieved a low-cost chip. Two types of HICs were fabricated for 880 MHz cellular band and 1. 9 GHz PHS (Personal Handy phone System) band. The HIC at 880 MHz measures only 5. 05. 01. 0 mm3, and offered a conversion gain of 25 dB, a noise figure of 4. 2 dB and an image rejection ratio of 12 dB at 2. 7 V and at a power supply of 3. 5 mA. The HIC for 1. 9 GHz measures only 3. 54. 01. 0 mm3, and showed a conversion gain of 16. 0 dB, a II P3 of -16. 0 dBm, and an image rejection ratio of over 20 dBc at 3. 0 V and at power supply of 4. 5 mA.

A copper(Cu) thick film conductor containing glass and metal oxide for aluminum niride(AlN) substrate was developed. The conductor showed adhesion strength and reliability which were almost comparable to those of Ag-Pd conductors and also had good solder wettability and erosion properties. The Cu conductors must be fired in a nitrogen atmosphere containing oxygen gas. When they were fired under a low oxygen concentration, the gasses thermally decomposed and their properties changed which meant that the molten gasses could not flow smoothly to the AlN surface, so adhesion strength decreased. On the other hand, under high oxygen concentration, the adhesion strength increased because the thermal decomposition and property changes were suppressed. However, poorer solder wettability was brought about because copper was oxidized. Metal oxide added to the conductor could improve the wettability without decreasing the adhesion strength, even if it was fired at the higher oxygen concentration. Suitable metal oxides were CdO, Co3O5 and Fe2O3.

Low-power technology for front-end GaAs ICs and hybrid IC (HIC) for a mobile communication equipment will be presented. For low-power operation of GaAs front-end ICs, new techniques of the intermediate tuned circuits, the single-ended mixer, dualgate MESFETs, and the asymmetric self-aligned LDD process were investigated. The designed down-converter IC showed conversion gain of 21 dB, noise figure of 3.5 dB, 3rd-order intercept point in output level (IP3out) of 4.0 dBm, image-rejection ratio of 20 dB at 880 MHz, operating at 3.0 V of supply voltage and 5.0 mA of dissipation current. The down-converter IC was also designed for 1.9 GHz to obtain conversion gain of 20 dB, noise figure of 4.0 dB, IP3out of 4.0 dBm, image-rejection ratio of 20 dB at 3.0 V, 5.0 mA. The up-converter IC was designed for 1.9 GHz using the same topology of circuit and showed conversion gain of 15 dB, IP3out of 7.5 dBm, and 1 dB compression level of -8 dBm with -20 dBm of LO input power, operating at 3.0 V, 8.0 mA. Another approach to the low-power operation was carried out by HIC using the GaAs down-converter IC chip. The HIC was designed for 880 MHz to show conversion gain of 27 dB, noise figure of 3.3 dB, IP3out of 3.0 dBm, image-rejection ratio of 12 dB, at 2.7 V, 4.5 mA. The HIC measures only 8.0 mm6.0 mm1.2 mm.